When an electron beam interacts with an electron sensitive resist, it induces chemical reactions in the resist material. These reactions can either increase or decrease the solubility of the resist in developer solutions, depending on whether a positive or negative resist is used. Positive resists become more soluble where they are exposed to the electron beam, allowing the exposed areas to be washed away during development. In contrast, negative resists become less soluble upon exposure, so the unexposed areas are removed during development.
