The process begins with the synthesis of block copolymers. These copolymers are then deposited onto a substrate, where they are allowed to self-assemble into specific morphologies such as spheres, cylinders, or lamellae. The key steps include:
Spin Coating: The block copolymer solution is spin-coated onto the substrate to form a thin film. Annealing: The film is then annealed, either thermally or using solvent vapor, to promote self-assembly into the desired nanoscale structures. Etching: Selective etching techniques are employed to remove one of the polymer blocks, leaving behind a nanopattern on the substrate.
