How do Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) contribute?
Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) are vital for synthesizing high-quality nanomaterials. CVD involves the deposition of gaseous reactants onto a substrate, forming thin films of nanomaterials. PVD, on the other hand, involves the physical transfer of material from a target to a substrate. Both techniques offer control over thickness, composition, and crystallinity of the resulting nanomaterials.
