There are several methods to fabricate ultrathin films, each offering specific advantages and challenges:
Atomic Layer Deposition (ALD): This technique allows for the precise control of film thickness at the atomic level. Chemical Vapor Deposition (CVD): Widely used for creating thin films of semiconductors, CVD involves the chemical reaction of vapor-phase precursors on a substrate. Physical Vapor Deposition (PVD): This method includes techniques like sputtering and evaporation to deposit material onto a substrate. Molecular Beam Epitaxy (MBE): Used primarily for creating high-quality crystalline films, MBE involves the deposition of atoms or molecules onto a substrate under ultra-high vacuum conditions.
