The fabrication of standard silicon tips involves several key steps: 1. Photolithography: A silicon wafer is coated with a light-sensitive photoresist and exposed to a pattern of light, defining the tip's shape. 2. Etching: The exposed areas are etched away using chemical or plasma etching, creating the sharp tip structure. 3. Doping and Coating: Tips may be doped with impurities or coated with conductive materials to tailor their electrical properties for specific applications.
