The fabrication of PICs involves several nanotechnology-enabled processes:
1. Lithography: Techniques like electron-beam lithography and photolithography are used to create nanoscale patterns on semiconductor substrates. 2. Etching: Dry and wet etching methods help in shaping the optical components at the nanoscale. 3. Deposition: Thin films of materials are deposited using methods like chemical vapor deposition (CVD) and atomic layer deposition (ALD). 4. Doping: Introducing impurities into semiconductors to alter their optical properties.
