The fabrication of NEMS typically involves advanced techniques like Electron Beam Lithography, Focused Ion Beam Milling, Atomic Layer Deposition, and Chemical Vapor Deposition. These techniques allow for precise patterning and layering of materials at the nanoscale. The choice of material is crucial, with silicon, carbon nanotubes, and graphene being some of the most commonly used materials due to their exceptional mechanical and electrical properties.
