The production of high purity films involves several sophisticated techniques:
1. Chemical Vapor Deposition (CVD): A process where a material is deposited from a vapor by chemical reactions occurring on or near the substrate surface. 2. Physical Vapor Deposition (PVD): Techniques like sputtering or evaporation, where material is physically transferred from a source to the substrate. 3. Atomic Layer Deposition (ALD): A method that deposits thin films one atomic layer at a time, allowing for precise control over thickness and composition.
