hard mask techniques

How are Hard Masks Applied?

The application of hard masks involves several steps:
1. Deposition: A thin film of the hard mask material is deposited onto the substrate using techniques like chemical vapor deposition (CVD), physical vapor deposition (PVD), or atomic layer deposition (ALD).
2. Patterning: The hard mask layer is then patterned using conventional lithography methods, such as photolithography or electron beam lithography.
3. Etching: The patterned hard mask acts as a stencil for etching the underlying layers. This can be done using dry etching techniques like reactive ion etching (RIE) or wet etching.

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