T-NIL offers several advantages over other lithography techniques:
High Resolution: It can produce patterns with feature sizes down to a few nanometers, making it highly suitable for applications requiring high precision. Cost-Effectiveness: The process is relatively simple and does not require expensive equipment, reducing overall manufacturing costs. Versatility: T-NIL can be used with a wide range of materials, including polymers, metals, and semiconductors. Scalability: It is suitable for high-volume production, making it ideal for industrial applications.
