PGMEA plays a crucial role in nanotechnology due to its unique properties:
High Purity: PGMEA used in nanotechnology is of high purity, ensuring minimal contamination during the fabrication of sensitive nanostructures. Good Solubility: It has excellent solubility for a wide range of photoresist materials, making it versatile for different lithographic processes. Controlled Evaporation: The controlled evaporation rate of PGMEA allows for precise pattern development, which is essential for creating nanoscale features.
