Several techniques are employed to achieve the necessary precision in nanotechnology manufacturing:
Lithography: This method uses light to etch patterns on a surface, allowing for the creation of intricate nanostructures. Atomic Layer Deposition (ALD): In ALD, thin films are deposited one atomic layer at a time, offering exceptional control over film thickness and composition. Electron Beam Lithography (EBL): EBL uses a focused beam of electrons to create extremely fine patterns, ideal for nanoscale features. Scanning Tunneling Microscopy (STM): STM allows for the manipulation of individual atoms, offering unprecedented precision in constructing nanostructures.
