Several advanced techniques are employed to achieve compactness in nanotechnology. Some of these include:
Atomic Layer Deposition (ALD): This technique allows for the precise deposition of thin films, enabling the creation of highly compact structures. Molecular Beam Epitaxy (MBE): MBE is used to grow highly ordered and compact thin films and nanostructures with atomic precision. Self-Assembly: This process involves the spontaneous organization of molecules into compact, ordered structures without external guidance. Nanoimprint Lithography (NIL): NIL is a technique used to create compact nanoscale patterns with high precision and repeatability.
