What Techniques are Used in Rapid Prototyping for Nanotechnology?
Several techniques are employed in rapid prototyping for nanotechnology, including:
- Electron Beam Lithography (EBL): This technique uses a focused beam of electrons to create extremely fine patterns on a substrate, enabling the fabrication of nanoscale features. - Nanoimprint Lithography (NIL): NIL involves pressing a mold with nanoscale features into a substrate to pattern it, offering high resolution and throughput. - Dip-Pen Nanolithography (DPN): DPN utilizes an atomic force microscope tip to "write" molecules onto a surface with high precision. - Focused Ion Beam (FIB): FIB can be used for both imaging and manipulating materials at the nanoscale, making it useful for prototyping complex nanostructures.
