What Techniques are Used in Nanotechnology Fabrication?
Several techniques are employed to fabricate nanostructures, each with its own advantages and limitations.
1. Lithography: This includes techniques such as photolithography and electron-beam lithography. Lithography is widely used for creating patterns on silicon wafers, essential for semiconductor manufacturing.
2. Self-Assembly: Self-assembly utilizes the natural tendency of molecules to organize themselves into ordered structures. This method is beneficial for creating complex structures without the need for external guidance.
4. Atomic Layer Deposition (ALD): ALD allows for the deposition of atomic layers with precise control over thickness and composition, making it ideal for applications requiring high uniformity.
5. Nanoimprint Lithography: This technique uses a mold to imprint nanoscale patterns onto a substrate. It is a cost-effective method for mass production of nanostructures.
