What Techniques are Used for Precise Material Ablation?
Several techniques are employed for precise material ablation in nanotechnology:
Laser Ablation: Utilizes high-energy laser pulses to remove material. The wavelength and pulse duration can be controlled to achieve high precision. Focused Ion Beam (FIB) Milling: Uses a focused beam of ions to sputter material away. It offers sub-nanometer precision and is often used for prototype development and failure analysis. Electron Beam Lithography (EBL): Employs a focused beam of electrons to pattern materials at the nanoscale. This technique is highly precise but can be time-consuming. Atomic Force Microscopy (AFM) Nanolithography: Uses the tip of an AFM to mechanically remove or modify material at the nanoscale.
