What Techniques are Used for Doping at the Nanoscale?
Several techniques are employed for doping at the nanoscale, including:
Ion Implantation: This technique involves bombarding the semiconductor with high-energy ions, which get embedded into the material. Chemical Vapor Deposition (CVD): In this method, chemical reactions produce a thin film of the doped material on a substrate. Molecular Beam Epitaxy (MBE): A highly controlled method where atoms are deposited onto a substrate in a vacuum environment. Solution-based Doping: A method where nanomaterials are doped in a liquid solution, often used for quantum dots and nanowires.
