Various techniques are employed for analyzing thin films and multilayers, each with its specific advantages and limitations:
1. X-ray Diffraction (XRD): This technique is used to determine the crystalline structure of thin films. It provides information about the orientation, grain size, and stress within the films.
2. Scanning Electron Microscopy (SEM): SEM offers high-resolution images of the film's surface morphology. It is particularly useful for observing the topography and composition of the films.
3. Transmission Electron Microscopy (TEM): TEM provides detailed images at the atomic level, making it ideal for analyzing the internal structure of multilayers.
4. Atomic Force Microscopy (AFM): AFM is used to measure the surface roughness and thickness of thin films. It can operate in various environments, including vacuum, air, and liquid.
5. Ellipsometry: This optical technique measures the thickness and optical properties of thin films. It is non-destructive and can analyze films in real-time.
