A high-quality resist must possess a range of properties to be effective in nanotechnology applications:
Sensitivity: The resist must respond well to the exposing radiation, whether it is UV light, electron beams, or another source. Resolution: The resist should allow for the creation of very fine patterns, often in the range of a few nanometers. Contrast: This refers to the ability of the resist to differentiate between exposed and unexposed regions, resulting in clear patterns. Adhesion: The resist must adhere well to the substrate to prevent pattern distortion during development. Stability: The resist should maintain its properties under various environmental conditions and during the processing steps.
