UV NIL involves pressing a mold with nanoscale features into a liquid resist layer applied on a substrate. Once the mold is in place, UV light is used to cure the resist, solidifying the pattern. The mold is then removed, leaving a high-fidelity replica of its nanostructures on the substrate. This technique is essential for creating nanodevices and nanoelectronics due to its ability to produce fine features with excellent uniformity.
