What is Low Pressure Chemical Vapor Deposition (LPCVD)?
Low Pressure Chemical Vapor Deposition (LPCVD) is a widely used technique in the field of nanotechnology for the deposition of thin films. It operates under low-pressure conditions, typically in the range of 0.1 to 1 Torr, to deposit materials onto substrates through chemical reactions. This method is essential for producing high-quality, uniform films with excellent step coverage, which are critical for various nanofabrication processes.
