Hot Wire Chemical Vapor Deposition (HWCVD) is a deposition technique used to create thin films through the thermal decomposition of precursor gases. In this process, a hot wire typically made of tungsten or tantalum is heated to high temperatures (around 1500-2200°C), causing the precursor gas molecules to break apart and deposit on a substrate as a thin film. This method is also known as catalytic CVD or filament-assisted CVD.
