What Challenges are Associated with Patterning Nanostructures?
Patterning at the nanoscale comes with several challenges:
- Resolution Limits: Techniques like photolithography are limited by the wavelength of light, which restricts the minimum feature size that can be achieved.
- Alignment and Overlay: Accurately aligning multiple layers of patterns is critical, especially in complex devices, and any misalignment can lead to device failure.
- Material Stability: At the nanoscale, materials can behave differently, and ensuring the stability of patterns over time can be challenging.
- Cost and Scalability: High-resolution techniques like EBL are expensive and slow, making them less practical for mass production. Finding a balance between resolution, cost, and scalability is an ongoing challenge.
