Several techniques are employed in nanofabrication, each with its strengths and limitations:
Lithography: This includes photolithography and electron beam lithography (EBL). Photolithography is widely used for mass production, while EBL offers high precision for research purposes. Self-Assembly: Involves the spontaneous organization of molecules into structured arrangements. This technique is essential for creating complex nanomaterials without external guidance. Chemical Vapor Deposition: A process where gaseous reactants form a solid material on a substrate. CVD is crucial for producing high-quality nanotubes and nano-coatings. Nanoimprint Lithography: Uses a mold to create nanoscale patterns. It is a cost-effective method suitable for high-throughput production.
