Several techniques are employed to achieve conformality in nanotechnology:
1. Atomic Layer Deposition (ALD): This technique is renowned for its ability to create highly conformal thin films by alternating exposure to precursor gases, allowing for precise control over film thickness and composition. 2. Chemical Vapor Deposition (CVD): By using chemical reactions to deposit materials in a vapor phase, CVD can achieve good conformality, especially when used in combination with other techniques. 3. Spin Coating: Although primarily used for flat surfaces, modifications in spin coating techniques can enhance conformality over complex topographies. 4. Electrodeposition: This method can also achieve conformal coatings, particularly when combined with additives that improve the uniformity of the deposited layer.
