Several methods exist for nano lithography, each with its own advantages and limitations:
Electron-beam Lithography (EBL): This technique uses a focused beam of electrons to pattern the resist on a substrate. It offers high resolution but is relatively slow and expensive. Scanning Probe Lithography (SPL): Uses a sharp tip to mechanically or chemically modify the surface at the nanoscale. Techniques like Atomic Force Microscopy (AFM) are common examples. Nanoimprint Lithography (NIL): Involves pressing a mold into a soft film to create patterns. This method is faster and can be scaled up for mass production. Photolithography: Though traditionally used for micro-scale patterns, advanced photolithography can achieve nanoscale resolution using extreme ultraviolet (EUV) light.
