Various techniques are used in scalable nanofabrication, each with its own set of advantages and limitations:
Top-Down Approaches
Photolithography: Widely used in the semiconductor industry, it involves patterning a substrate using light. Photolithography offers high precision but is limited by the wavelength of the light used. Electron Beam Lithography: Uses a focused beam of electrons to create patterns on a surface. It offers higher resolution than photolithography but is slower and more expensive.
Bottom-Up Approaches
Self-Assembly: Utilizes the natural tendency of molecules to organize into well-defined structures. This method is cost-effective and scalable but may lack precision. Chemical Vapor Deposition (CVD): Involves the chemical reaction of gaseous precursors on a substrate to form thin films. CVD is widely used for producing high-quality graphene and carbon nanotubes.
