atomic layer deposition (ald)

What are the Limitations of ALD?

Despite its advantages, ALD has some limitations:
Slow Deposition Rate: The layer-by-layer growth mechanism results in relatively slow deposition rates compared to other techniques like Chemical Vapor Deposition (CVD).
Complex Equipment: ALD systems are generally more complex and expensive, requiring precise control over gas flow and temperature.
Material Limitations: Not all materials can be deposited via ALD due to the lack of suitable precursors or reaction pathways.

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