Several direct write techniques are commonly used in nanotechnology:
1. Focused Ion Beam (FIB): This method uses a focused beam of ions to etch away material or deposit it onto a substrate. It is highly precise and can create extremely fine features. 2. Electron Beam Lithography (EBL): EBL uses a focused beam of electrons to write patterns onto an electron-sensitive resist material. It offers extremely high resolution but is generally slower than other methods. 3. Laser Direct Write (LDW): In LDW, a laser beam is used to deposit or ablate material. This technique is versatile and can be used for a variety of materials, including polymers and metals.
