Several advanced techniques are utilized in nanotechnology fabrication, each with its unique advantages:
Photolithography: Widely used for fabricating integrated circuits, it uses light to transfer geometric patterns onto a substrate. Electron Beam Lithography (EBL): Utilizes focused electron beams to create very fine patterns, essential for research and prototyping. Atomic Layer Deposition (ALD): A thin film deposition technique that allows for precise control over film thickness and composition. Molecular Beam Epitaxy (MBE): Used to fabricate high-purity crystals by depositing atomic layers on a substrate. Nanoimprint Lithography (NIL): A cost-effective technique that can replicate nanoscale patterns with high fidelity.
