The transition to 5nm technology presents several challenges, including:
Lithography: The primary challenge is achieving the required precision in patterning at such a small scale. Extreme Ultraviolet (EUV) lithography is essential for 5nm manufacturing. Materials: Developing and utilizing new materials that can withstand the electrical and thermal stress at the nanoscale. Design: Ensuring that circuit designs can take full advantage of the smaller feature sizes while maintaining performance and reliability. Manufacturing Yield: Achieving high yields becomes more complex as defect rates rise with smaller geometries.
