Several techniques are employed for metallization in nanotechnology:
Chemical Vapor Deposition (CVD): This process involves the decomposition of a metal-containing gas to form a thin metal layer on the substrate. Physical Vapor Deposition (PVD): Here, metals are vaporized in a vacuum and deposited onto the nanomaterial. Electrochemical Deposition: This method uses an electric current to reduce metal ions onto a conductive surface. Atomic Layer Deposition (ALD): A precise technique that allows for the controlled deposition of atomic layers of metal.
