uv nanoimprint lithography (uv nil)

What Are the Challenges in UV NIL?

Despite its advantages, UV NIL faces several challenges:
Alignment: Achieving precise alignment between the mold and the substrate can be difficult, especially for multilayer structures.
Defects: The presence of defects in the mold or during the imprinting process can affect the quality of the final patterns.
Material Limitations: Finding suitable UV-curable resists with the desired properties can be challenging.
Durability: The mold may wear out over multiple uses, requiring frequent replacements.

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