What are the Advantages of Chemical Vapor Deposition (CVD)?
Chemical Vapor Deposition (CVD) is a versatile technique for producing high-quality, high-performance solid materials. It involves the chemical reaction of gaseous precursors on a substrate to form a thin film. CVD is widely used for coating, surface modification, and the fabrication of nanotubes and nanowires. The main advantages include uniformity, scalability, and the ability to produce materials with precise properties.
