Several innovative techniques have emerged, enhancing the capabilities of nanotechnology:
Atomic Layer Deposition (ALD)
ALD is a thin-film deposition technique that allows for the precise control of film thickness at the atomic level. It is particularly useful for
coating complex three-dimensional structures with uniform layers, which is essential in semiconductor and energy storage applications.
Scanning Tunneling Microscopy (STM)
STM is a powerful technique for imaging surfaces at the atomic level. It operates by scanning a sharp tip over the surface while measuring tunneling current. STM has enabled the detailed
characterization of nanomaterials and the manipulation of individual atoms and molecules.
Graphene Synthesis
Graphene, a single layer of carbon atoms arranged in a hexagonal lattice, has extraordinary electrical, mechanical, and thermal properties. Improved techniques for the
synthesis of high-quality graphene, such as chemical vapor deposition (CVD) and mechanical exfoliation, have made it more accessible for various applications, including flexible electronics and composite materials.
Nanolithography
Nanolithography encompasses several techniques used to etch, print, or write patterns on a nanometer scale. Advances in techniques such as
electron-beam lithography (EBL) and nanoimprint lithography (NIL) have significantly improved the resolution and throughput, enabling the production of more complex and smaller nanodevices.
Quantum Dots
Quantum dots are semiconductor nanoparticles that exhibit unique optical and electronic properties due to quantum confinement. Improved methods for the
synthesis and surface functionalization of quantum dots have expanded their use in bioimaging, photovoltaics, and quantum computing.
