Several techniques are employed to achieve surface structuring at the nanoscale:
Nanolithography: This technique uses light, electrons, or ions to pattern a surface at the nanoscale. It is widely used in the semiconductor industry for the fabrication of integrated circuits. Etching: Both chemical and physical etching processes are used to remove material from a surface to create desired patterns or structures. Self-assembly: This approach involves the spontaneous organization of molecules into structured arrangements, driven by specific interactions such as hydrogen bonding or van der Waals forces. Nanoimprint Lithography: A technique that uses a stamp to imprint patterns onto a surface, offering a cost-effective and high-throughput method for nanostructuring.
