Several techniques are employed to measure film thickness, each with its advantages and limitations:
Ellipsometry: A non-destructive optical method that measures the change in polarization as light reflects or transmits through the film. Atomic Force Microscopy (AFM): Provides high-resolution surface topography, allowing for precise thickness measurements at the nanoscale. X-ray Reflectivity (XRR): Utilizes X-rays to probe the film and determine its thickness based on the reflected intensity patterns. Scanning Electron Microscopy (SEM): Offers high-resolution imaging that can be used to measure cross-sectional thickness.
