exposure monitoring

How is Exposure Monitoring Conducted?

Exposure monitoring in nanotechnology typically involves both direct and indirect methods:
- Direct Methods: These include real-time monitoring instruments such as scanning mobility particle sizers (SMPS) and condensation particle counters (CPC). These tools measure the number, size distribution, and concentration of nanoparticles in the air.
- Indirect Methods: These involve sampling techniques followed by laboratory analysis. For example, air filters can be used to collect nanoparticles, which are then analyzed using techniques like electron microscopy and X-ray diffraction (XRD).

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