etching pattern

How is Etching Pattern Achieved?

Etching patterns are typically achieved through a process called photolithography. Here's a simplified overview:
A substrate is coated with a light-sensitive material called photoresist.
The photoresist is exposed to ultraviolet light through a mask that defines the desired pattern.
Exposed or unexposed regions of the photoresist are then developed, leaving behind a resist pattern.
The substrate is subjected to etching, where the pattern is transferred from the photoresist to the underlying material.

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