Several techniques are employed to achieve enhanced accuracy in nanotechnology:
1. Atomic Layer Deposition (ALD): This method allows for the deposition of thin films one atomic layer at a time, ensuring uniform thickness and composition. 2. Electron Beam Lithography (EBL): This technique uses a focused beam of electrons to create extremely fine patterns required for nanoscale devices. 3. Scanning Probe Microscopy (SPM): Tools such as Atomic Force Microscopy (AFM) and Scanning Tunneling Microscopy (STM) enable the manipulation and characterization of materials with atomic precision.
