The basic principle of plasmonic nanolithography involves focusing light onto a metallic nanostructure to generate surface plasmons. These surface plasmons then interact with a substrate coated with a photoresist material. The localized electromagnetic fields created by the surface plasmons can modify the photoresist, allowing for precise patterning. This technique can achieve resolutions beyond the diffraction limit of light, making it highly suitable for fabricating nanostructures with features as small as a few nanometers.
