In an MBE system, effusion cells containing high-purity source materials are heated to create a beam of atoms or molecules. These beams are directed towards the substrate, which is also heated to facilitate the epitaxial growth of the material. The process is meticulously controlled by adjusting the temperature, beam flux, and deposition rate to achieve desired layer thicknesses and compositions. The UHV environment ensures minimal contamination, resulting in high-quality thin films.
