Masking: A mask is applied to the material to protect certain areas. This mask can be made of photoresist, metals, or oxides. Exposure: In the case of dry etching, the material is exposed to a plasma or gas. For wet etching, the material is immersed in a chemical bath. Etching: The exposed areas of the material are etched away, leaving behind the desired pattern. Cleaning: The material is cleaned to remove any residual chemicals or particles.