Achieving precision in nanotechnology involves several techniques and tools:
Atomic Force Microscopy (AFM): This technique allows for the imaging, measuring, and manipulating of materials at the atomic level. Electron Beam Lithography (EBL): A method that uses focused beams of electrons to create extremely fine patterns required for nanoscale devices. Self-Assembly: Leveraging the natural propensity of molecules to form ordered structures without human intervention. Molecular Beam Epitaxy (MBE): A method for laying down layers of materials with atomic precision, commonly used in semiconductor manufacturing.