Several techniques are employed to deposit materials at the nanoscale. Some of the most common methods include:
- [Chemical Vapor Deposition (CVD)](): A process where gaseous reactants form a solid material on a substrate through chemical reactions. - [Physical Vapor Deposition (PVD)](): In this method, materials are vaporized and then condensed onto a substrate to form a thin film. - [Atomic Layer Deposition (ALD)](): This technique involves the sequential use of gas phase chemical processes to deposit atomic layers of material. - [Electrochemical Deposition](): A method where an electric current is used to reduce metal ions from a solution to form a coherent metal coating.
