Surfaces in nanotechnology labs are cleaned using specialized methods to ensure thorough decontamination. Techniques include the use of solvent cleaning, ultrasonic baths, and plasma cleaning. Solvent cleaning involves the use of high-purity solvents to dissolve contaminants, while ultrasonic baths use high-frequency sound waves to dislodge particles. Plasma cleaning employs ionized gas to remove organic residues from surfaces.
