Achieving clean surfaces involves several techniques:
Ultrasonic Cleaning: This involves the use of high-frequency sound waves to remove contaminants from surfaces. It is highly effective for removing particles at the nanoscale. Plasma Cleaning: This technique uses ionized gas to remove organic contaminants. It is particularly useful for cleaning surfaces prior to thin film deposition. Chemical Cleaning: Various chemicals can be used to dissolve and remove contaminants. For example, piranha solution is often used to clean substrates in nanofabrication. Physical Cleaning: Techniques such as laser cleaning and mechanical polishing can also be employed to achieve clean surfaces.
