Author Information
Robert A. Wolkow is a distinguished researcher in the field of Nanotechnology, currently affiliated with the Department of Physics at the University of Alberta in Edmonton, Alberta, Canada. He also holds affiliations with Quantum Silicon Inc. and the Nanotechnology Research Centre, National Research Council Canada, both also located in Edmonton, Alberta. His research primarily focuses on atomic-scale device fabrication and characterization, with significant contributions to the development of silicon-based quantum dot circuits and nanofabrication techniques.
Research Contributions
Robert A. Wolkow has made substantial contributions to the field of nanotechnology through his extensive research on silicon atomic surface wires, reactive gas etching, and scanning tunneling microscopy (STM). His work includes notable advancements in ionic charge distributions, field-assisted reactive gas etching, and the development of tools like SiQAD for designing and simulating atomic silicon quantum dot circuits. His research has also leveraged deep learning techniques for autonomous hydrogen lithography and surface characterization, underscoring his interdisciplinary approach that integrates physics, chemistry, and computational methods.
Aliases
Robert A. Wolkow is also known by several aliases in scientific publications, including Robert A Wolkow, R. A. Wolkow, R.a. Wolkow, Robert Wolkow, R. Wolkow, R Wolkow, and R A Wolkow.
Publication and Citation Metrics
| Citation Count |
5738 |
| h-index |
41 |
| Paper Count |
184 |
