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Photolithography: A process that uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate.
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Electron Beam Lithography (EBL): Utilizes a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive resist.
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Nanoimprint Lithography (NIL): A method of fabricating nanometer-scale patterns by mechanical deformation of imprint resist and subsequent processes.
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Self-Assembly: A process where molecules spontaneously form ordered structures without human intervention.
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Electronics: Creation of smaller, faster, and more efficient semiconductor devices.
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Medicine: Development of targeted drug delivery systems and diagnostic tools.
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Energy: Fabrication of high-efficiency solar cells and batteries.
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Materials Science: Development of new materials with unique properties such as
graphene.
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Scalability: Difficulty in scaling up processes from the lab to industrial production.
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Cost: High expense of equipment and materials.
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Precision: Need for extreme precision and control over manufacturing processes.
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Contamination: Sensitivity to contamination, requiring cleanroom environments.