What is Line Edge Roughness (LER)?
Line Edge Roughness (LER) refers to the deviations or fluctuations in the edge of a patterned line from its intended path. In the field of
nanotechnology, achieving precise and smooth edges at the nanoscale is critical for the performance and reliability of
nanodevices and
integrated circuits (ICs). LER can significantly affect the electrical properties and overall functionality of these nanoscale structures.
Photolithography process variability, where irregularities in light exposure and development can result in rough edges.
Material properties, such as
photoresist composition and behavior during the development process.
Etching processes, where non-uniform etching rates can contribute to edge roughness.
Environmental factors, such as temperature and humidity variations during fabrication.
Future Directions
As the push for smaller and more efficient
nanodevices continues, research into minimizing LER is intensifying. Innovations in
lithography technology, new
materials, and advanced
fabrication techniques hold promise for reducing LER to acceptable levels, ensuring the continued advancement of nanotechnology.
